웨스트팩

 
Environics

ENVI-Air™ Orthogonal Detection

       Ion Mobility Spectrometry (IMS)

-          Molecular Acids- HCl, HF, SO2, HNO3, Cl2

       Gas Chromatography-Ion Mobility Spectrometry (GC-IMS)

-          Molecular Bases- Ammonia, Amines, NMP

       Gas Chromatography-Photo Ionization Detector (GC-PID)

-          Solvents- PGMEA, IPA, Toluene, Acetone, Alcohols Hydrocarbons

 
 

Semiconductor AMC Monitors

Feature

Environics ENVI-Air™ System

Technology

GC-IMS, IMS and GC-PID with 1-64 sample points

Compounds Monitored

Molecular Bases- Ammonia, Amines…

Molecular Acids- HF, HCl, Cl2, SO2…

Organics- solvents, condensables…

Detection Range

0.1-1000 ppb

Pre-concentrator (optional) for lower ranges

Sample Time

1-3 minutes (acids, bases & organics)

Radioactive License and Wipe Tests Required

No, exempt Tritium (3-H) source

 

AMC  Contaminants

AMC Class

Contaminants

Sources

Effects

Molecular Acids

HF, HCl, SO2, NOx, Cl2

Etch Chambers, Diffusion Furnaces, Wet Benches, CVD

Hazing of reticles, wafers, optics of exposure & metrology tools, Corrosion of Al & Cu metal lines

Molecular Bases

Ammonia, Amines, NMP

CVD, HMDS, CMP, slurries, wafer cleaning processes, TiN films deposition, Si3N4 films deposition, photo resist strippers, polymers, epoxies, TMAH decomposition

Neutralizes photo-acids in resists. Reacts with acid vapors can cause hazing, particle formation, nitrides on wafer surface

Molecular Condensables

PGMEA, HMDS, NMP, Phthalates, Organophosphates

Outside air, process chemicals, outgassing from filter, sealants, walls, adhesives, floors, wafer shippers, FOUPS, pods flame retardants

Hazing of exposure tool optics and masks, from silicones & HMDS by-products, Delaminating of PR and ARCs

Molecular Dopants

Boron, Phosphorous, Organo -phosphorous, Arsenic, Antimony

Degradation of HEPA & ULPA filters, exhaust from RIE, EPI, CVD processes, flame retard.

Unwanted n- and p- doping of wafers

Molecular Metals

Organo-metallic

Cross-contamination of wafers, Plastic additives containing metals, metal duct work

Particulates in air, on wafers

 

Integrated Multipoint Sampling System

                 

u  Fast Loop Design

u  Teflon Rotary Valves

u  Minimal Dead Volume

u  Rapid Sample Switching

u  User Defined Sample Sequencing

u  Quick Connects for New Samples

 
PRODUCTS

 

l  For continuous monitoring of molecular bases, acids and hydrocarbons, these analyzers utilize IMS, GC-IMS or GC-PID to detect the class of compounds in the 0-100 ppb concentration range.

l  Uses a new 3H (tritium) source that is exempted from semi-annual wipe tests or government licensing.


 
ENVI-AirS™ Series Analyzers

 

ENVI-AMS200™

l  For continuous multi-points sampling from 2 to 64 different points.

l  Utilizes a fast loop pump design to assure fresh sample is available and dead volume is kept to a minimum. 

l  All wetted surfaces are Teflon, including pump heads, connectors and valves. 

l  Rotary valve design keeps moving parts and maintenance to a minimum.

l  Portable IMS MINI for clean room surveys and mapping hotspots


 

APPLICATION

Semiconductor / LCD manufacturing Fab

Gas, Oil and Chemical Plant

Industrial Market:

 -   Process Gas Measurement

 -   Ambient Air Measurement

 -   Stack Gas Measurement

 -   Environmental Monitoring



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