웨스트팩

  제품사진 제품명
리스트 게시판
EUV Technology
EUV Mask Reflotmeter System
EUV Outgoing Gass Analyzer System

www.euvl.com
Molecular Imprints
Nanoimprint Lithography System

www.molecularimprints.com
Litho Tech Japan
Resist Analysis system
Lithography Process System

www.ltj.co.jp
RDA(ARM) Series
The Resist Development Analyzer is the most-advanced 18-channel development rate analysis evaluation equipment. Using this system, you can promptly carry out developing characteristic analysis such as measurement of photoresists development rates and calculation of contrast curves and sensitivity. You can also accurately determine resist model parameters required for the lithography simulator.
EXPOSURE SYSTEM
Exposure tool for research and development of photoresists
Exposure with G,H,I-line,KrF,ArF, EUV & E-BEAM
ELRC
Repair, refurbish, service, and supply maintenance tooling for Cymer lasers series 5000, 6000, and 7000 series.

- ELRC provides a low cost solution for laser
operations
- Provide ALL parts necessary for your 5000, 6000
generation Cymer lasers
- Parts available for laser frame 7000 now and consumable
modules are to be ready by early 2012.
- Provide the parts, services, tools and training to be
your complete source for Cymer laser support.
Environics
- Fast Loop Design
- Teflon Rotary Valves
- Minimal Dead Volume
- Rapid Sample Switching
- User Defined Sample Sequencing
- Quick Connects for New Samples
PR Coater & Developer
Automatic Coater/Developer/Bake system
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